Automatic Wafer Cleaning Device After Light Resistance

Semiconductor cleaning machine is essential for removing photoresist and ensuring precise cleaning of wafers after grinding. It plays a vital role in semiconductor manufacturing, ensuring that wafers are free of contaminants and prepared for further processing. JYN advanced system is designed to meet the specific needs of the semiconductor industry, offering customized solutions for wafer sizes ranging from 150mm to 300mm.

Application

The semiconductor cleaning machine is used in the following applications:

• Wafer cleaning after grinding processes.

• Removal of photoresist layers, particularly for wafers used in advanced semiconductor processes of 19nm or higher.

Our wafer cleaning machine can accommodate various wafer sizes, including 150mm, 200mm, and 300mm, with customizable options available to meet specific production needs.

Product Feature

• Load Ports:

JYN semiconductor cleaning machine configurable with 2 or 3 load ports for maximum flexibility.

• Touchscreen Control:

Our industrial wafer processing control machine with a touch screen operation interface, making it both con

venient and fast to use.

• IoT Integration:

Equipped with genuine industrial IoT configuration software, our wafer surface cleaner can seamless control and monitoring.